Mathematics, 04.03.2020 17:35, maay101
3.36 An article in the Journal of the Electrochemical Society (Vol. 139, No. 2, 1992, pp. 524–532) describes an experiment to investigate the low-pressure vapor deposition of polysilicon. The experiment was carried out in a large-capacity reactor at Sematech in Austin, Texas. The reactor has several wafer positions, and four of these positions are selected at random. The response variable is film thickness uniformity. Three replicates of the experiment were run, and the data are as follows: Wafer Position Uniformity 1 2.76 5.67 4.49 2 1.43 1.70 2.19 3 2.34 1.97 1.47 4 0.94 1.36 1.65 (a) Is there a difference in the wafer positions? Use = 0.05. (b) Estimate the variability due to wafer positions. (c) Estimate the random error component. (d) Analyze the residuals from this experiment and comment on model adequacy.
Answers: 1
Mathematics, 22.06.2019 02:00, emaleyhughes21
16x^2-16x=5 solve the equation by completing the square
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Mathematics, 22.06.2019 06:00, isa5166
The table shows how many people went on a roller coaster during 3 days. sean wants to know if the total of number of people is greater than 800. how can you answer sean's question without actually computing the total? explain. friday 158 people, saturday 292 sunday 278
Answers: 2
3.36 An article in the Journal of the Electrochemical Society (Vol. 139, No. 2, 1992, pp. 524–532) d...
Mathematics, 02.04.2020 23:38
Mathematics, 02.04.2020 23:38