design a semiconductor resistor with specified resistance to handle a given current denisty a semiconductor at T=300k Nd=5×10^15 cm^-3 acceptors are to be added to form a compensated p type material. the resistor is to have resistance 10kohm and handle a current denisty of 50A/cm^2 when 5v is applied

Explain the difference laminar and turbulent flow. explain it with the shear stress and the velocity profiles.

If the thermal strain developed in polyimide film during deposition is given as 0.0044. assume room temperature is kept at 17.3 c, and thermal coefficient of expansion for the film and the substrate are 54 x 10^-6c^-1 and 3.3 x 10^-6c^-1respectively. calculate the deposition temperature.

Ifa component is made of two or more materials with different modulus of elasticity (e), it is called a composite member and we calculate the factor·n". mention the formula for calculating n". also, ifn> 1, explain what will happen to the 1. transformed. gi) ifn 1, what will happen to the material when transformed material when