Engineering, 14.09.2019 02:10, labrandonanderson00

Apolyimide photoresist requires 90 mj/cm^2 per micron of thickness to be developed properly. if a lamp provides 900 w/m, how long does it take to expose a 40-μm-thick film?

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Apolyimide photoresist requires 90 mj/cm^2 per micron of thickness to be developed properly. if a la...