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Chemistry, 21.06.2019 16:00, saby30
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
Answers: 1
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Chemistry, 22.06.2019 18:00, rodriguezscarlet1713
Hydrogenation reactions, in which h2 and an "unsaturated" organic compound combine, are used in the food, fuel, and polymer industries. in the simplest case, ethene (c2h4) and h2 form ethane (c2h6). if 140 kj is given off per mole of c2h4 reacting, how much heat (in mj) is released when 12 kg of c2h6 forms?
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Chemistry, 22.06.2019 21:30, steven0448
An atomic nucleus is composed ofa)protons. b)protons and neutrons. c)protons and electrons. d)protons, neutrons, and electrons.
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