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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Acompound contains c, h, and o atoms. when 1.130 g of the compound is burned in oxygen, 1.064 g co2 and 0.3631 g h2o are produced. what is the empirical formula of this compound?

|using the periodic tablewarm-upuse the periodic table in the tools bar to answer the following questions. what elemental classification does oxygen belongto? done