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Chemistry, 21.06.2019 16:00, saby30
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900Λc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
Answers: 1
Chemistry, 22.06.2019 00:00, lakenyagillard79
Acurium-245 nucleus is hit with a neutron and changes as shown by the equation. complete the equation by filling in the missing parts. 52
Answers: 2
Iron (II) carbonate, which is also known as a ferrous carbonate, has been used as an iron dietary su...
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