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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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When the volume and number of particles of a gas are constant which of the following is also constant
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Frictional forces acting on an object are often converted into energy, which causes the temperature of the object to rise slightly.
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