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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Compare and contrast physical changes with chemical changes.

Describing intermolecular forces use the drop down menus to match the type of intermolecular force to its name dipole dipole interactions dipole induced dipole interactions london dispersion forces hydrogen bond van der waals forces done