Metal vapor deposition is a process used to deposit a very thin layer of metal on a target substrate. A researcher puts a glass slide in the metal vapor deposition chamber and coats the slide with titanium. After deposition, the glass slide had increased in mass by 2.05 milligrams. Approximately how many titanium atoms were deposited on the glass slide

2.58 * 10^19 atoms of titanium

Explanation:

Mass of Titanium ions deposited = 2.05 * 10^-3 g of Ti

Molar mass of titanium = 47.87 g/mol

Number of moles of Titanium deposited = 2.05 * 10^-3 g/47.87 g/mol = 4.28 * 10^-5 moles

Number of atoms of titanium deposited = number of moles of titanium * Avogadro's number

Number of atoms of titanium deposited =4.28 * 10^-5 moles * 6.02 * 10^23 = 2.58 * 10^19 atoms of titanium

aquifers are bounded above and below by impermeable rock. the driving force of groundwater movement in confined aquifers is pressure, rather than gravity.