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Chemistry, 21.06.2019 16:00, saby30
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 21.06.2019 23:00, fastpitchhailey1354
An electrons position cannot be known precisely only it's probability of being in a certain location can be known
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Chemistry, 22.06.2019 04:00, speris1443
Write the balanced equation for a reaction between aqueous nitric acid (hno3) and solid lithium metal (this is a single replacement reaction)
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Chemistry, 22.06.2019 10:00, aschool2000
Water's surface tension and heat storage capacity are accounted for by its a) orbitals b) weight c) hydrogen bonds d) mass e) size
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Describe the “backbone” of many polymers...
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