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Chemistry, 21.06.2019 16:00, saby30
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 16:30, jrfranckowiak
At 20°c, a sample of h2o liquid and a sample of co2 gas each have the same average kinetic energy. why is one a liquid and the other a gas at this temperature?
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Chemistry, 22.06.2019 20:30, kittybatch345
Is a chemical message sent by another individual.
Answers: 1
We can also use the equation for enthalpy change for physical phase changes. consider the phase chan...
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